Open Access

Table 1

Deposition parameters for the designed multilayer metamaterial.

Layer Target Sputtering pressure (Pa) Power (W) Deposition time (Sec) Assumed thickness (nm) Deposition temperature (°C)
ITO ITO 2.9 × 10−2 60 225 14 650
Ag Ag 1.9 × 10−2 50 33 6 20
SiO2 SiO2 2.2 × 10−2 120 822 46.7 20

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